Description

Featuring countless contemporary layout examples and practical information, New Page Design provides readers with a solid technical foundation for successful editorial design.

Now in paperback, New Page Design offers a comprehensive technical explanation of basic layout principles, a crucial graphic design field that covers the arrangement of typefaces, images, colours, objects, and grids on a page. New Page Design presents also a panorama of contemporary editorial design trends and styles through a selection of 100 projects, from newspapers and magazines to catalogues, books, brochures and posters. Supported by case studies and tips and tricks, within this book readers will gain an overall understanding of the fundamentals of editorial design, including paper size, typographic units, the history of typography and the styles of different typefaces, layout elements, interaction between sections, and the optimum way to visually convey a message. It is a perfect reference for designers who are looking for practical solutions and inspiration. The book includes interviews with Bruch --Idee & Form, Any Studio, Pyramid and Linus Lohoff.

Designers included and the countries they are working from at the moment of publication. Argentina: Mane
Tatoulian. Australia: M.
Giesser. Austria: Bruch--Idee & Form, Dominik Langegger. Brazil: Candice
Alencar, Nayelli Jaraba, Est dio Lampejo, Lucas Depolo Machado. Canada: Blok
Design. Chile: Crist bal Riesco. Denmark: Line Marie Rasmussen, Rasmus Jappe
Kristiansen. Finland: Bond
Creative Agency, Finland Tania Hoffr n, France:
Empire, Syndicat, GeneralPublic,
My Name is Wendy, Studio Fr ro. Germany: Any Studio, Bureau Borsche, Carina
M hler, komma team, Miriam K nig, Moby Digg, Slanted Publishers. Guatemala: Andr s
Higueros (+Mexico). Italy: Brando
Corradini, Carla Cabras, Due Collective, Gusto IDS, Muttnik. Poland: Karolina
Pietrzyk. Portugal: Sofia Felgueiras. Russia: Alsu Gilmanova, Ekaterina
Nikolaeva, Galya Dautova and Karina Yazylyan, Timur Babaev . Spain: Clara.B
Land n, creanet, David Reca, Leticia Ort n, Linus Lohoff. Sweden: Amanda & Erik, Studio Ahremark. The Netherlands: Format Wars.
Turkey: Fatih Hardal. UK: Pyramid
(+Portugal), Vincenzo Marchese Ragona. USA: Brian Liu (LA, CA), Pouya Ahmadi (Chigago,
IL), Sagmeister & Walsh (NY, NY).